U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Cleaning apparatus for substrate

Patent 5203798 Issued on April 20, 1993. Estimated Expiration Date: Icon_subject June 24, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Method and apparatus for the removal of deposits from a fuel injection valve
Patent #: 4082565
Issued on: 04/04/1978
Inventor: Sjolander

Ultrasonic cleaning apparatus
Patent #: 4475259
Issued on: 10/09/1984
Inventor: Ishii ,   et al.

Process and apparatus for developing including use of sound transducers
Patent #: 4652106
Issued on: 03/24/1987
Inventor: Jurgensen ,   et al.

Ultrasonic cleaning in liquid purification systems
Patent #: 4728368
Issued on: 03/01/1988
Inventor: Pedziwiatr

Decontaminating solid surfaces
Patent #: 4806277
Issued on: 02/21/1989
Inventor: Sakurai ,   et al.

Apparatus for treating wafers utilizing megasonic energy
Patent #: 4854337
Issued on: 08/08/1989
Inventor: Bunkenburg ,   et al.

Method for rinsing, cleaning and drying silicon wafers
Patent #: 4902350
Issued on: 02/20/1990
Inventor: Steck

High frequency sonic substrate processing module
Patent #: 5017236
Issued on: 05/21/1991
Inventor: Moxness, et al.

High frequency ultrasonic system
Patent #: 5038808
Issued on: 08/13/1991
Inventor: Hammond, et al.

Ultrasonic cleaning system for fluorescent light diffuser lens Patent #: 5090430
Issued on: 02/25/1992
Inventor: Nixon

Inventors

Assignee

Application

No. 720001 filed on 06/24/1991

US Classes:

134/184, With movable means to cause fluid motion (e.g., pump, splasher, agitator)134/122R, For sheet, web, strand or bar form work, longitudinally traveling134/151, With spray or jet applying conduits or nozzles134/902SEMICONDUCTOR WAFER

Examiners

Primary: Stinson, Frankie L.

Attorney, Agent or Firm

Foreign Patent References

  • 344902 SU 08/20/1972
  • 1431874 SU 10/20/1988
  • 1385750 GB 02/20/1975

International Class

B08B 009/10

Foreign Application Priority Data

1990-06-25 JP

Abstract

A cleaning apparatus capable of substantially complete removal of contaminations generated during the manufacturing process of glass substrates, semiconductor wafers, magnetic disk substrates, magnetic head substrates or the like. The cleaning apparatus comprises a cleaning bath which is greater in cross section than the material to be cleaned and which has an opening portion for insertion of the material to be cleaned, and an ultrasonic transducer attached to the cleaning bath. The apparatus precludes various defects arising from contaminations, and enhances reliability and yield of the substrates manufactured.

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