Patent ReferencesMethod and apparatus for the removal of deposits from a fuel injection valve Ultrasonic cleaning apparatus Process and apparatus for developing including use of sound transducers Ultrasonic cleaning in liquid purification systems Decontaminating solid surfaces Apparatus for treating wafers utilizing megasonic energy Method for rinsing, cleaning and drying silicon wafers High frequency sonic substrate processing module High frequency ultrasonic system Ultrasonic cleaning system for fluorescent light diffuser lens Patent #: 5090430 InventorsAssigneeApplicationNo. 720001 filed on 06/24/1991US Classes:134/184, With movable means to cause fluid motion (e.g., pump, splasher, agitator)134/122R, For sheet, web, strand or bar form work, longitudinally traveling134/151, With spray or jet applying conduits or nozzles134/902SEMICONDUCTOR WAFERExaminersPrimary: Stinson, Frankie L.Attorney, Agent or FirmForeign Patent References
International ClassB08B 009/10Foreign Application Priority Data1990-06-25 JPAbstractA cleaning apparatus capable of substantially complete removal of contaminations generated during the manufacturing process of glass substrates, semiconductor wafers, magnetic disk substrates, magnetic head substrates or the like. The cleaning apparatus comprises a cleaning bath which is greater in cross section than the material to be cleaned and which has an opening portion for insertion of the material to be cleaned, and an ultrasonic transducer attached to the cleaning bath. The apparatus precludes various defects arising from contaminations, and enhances reliability and yield of the substrates manufactured.Field of SearchWith movable means to cause fluid motion (e.g., pump, splasher, agitator)SEMICONDUCTOR WAFER With spray or jet supplying and/or applying means As pump or element thereof With spray or jet applying conduits or nozzles For sheet, web, strand or bar form work, longitudinally traveling For sheet, web, strand or bar form work, longitudinally traveling | |