Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin
Patent 5200291 Issued on April 6, 1993. Estimated Expiration Date: 
April 11, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
April 11, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2498722 3219447 3304297 3679419 3720563 3847614 3849392 3867147 Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith Amino acid stabilizers for water soluble diazonium compound condensation products InventorAssigneeApplicationNo. 684547 filed on 04/11/1991US Classes:430/163, Diazonium salt with anion specified430/157, Diazonium compound containing layer430/168, Process of making diazo product430/175, Polymeric diazonium compound430/272.1, Silicon containing backing or protective layer430/278.1, Aluminum430/302, Lithographic430/325, Post image treatment to produce elevated pattern430/330, Including heating430/331, Finishing or perfecting composition or product525/61, Chemical modification utilizing a chemical treating agent525/330.3, Polymer derived from acrylic or methacrylic esters, or vinyl acetate monomer525/330.5, Nitrogen containing chemical treating agent525/376, Nitrogen-containing compound has at least one nitrogen-to-nitrogen bond534/560, Hetero ring containing534/561, Plural diazo or diazonium groups534/563, Polycyclo ring system having at least three cyclos534/564, Aldehyde or ketone group containing534/565Formation of diazonium groupExaminersPrimary: Bowers, Charles L. Jr.Assistant: Young, Christopher G. Attorney, Agent or FirmForeign Patent References
International ClassesG03F 007/021G03F 007/32 AbstractA polymeric compound having the formula ##STR1## wherein x ranges from about 0.05 to about 0.5y ranges from about 0.80 to about 0.35z ranges from about 0.10 to about 0.25n ranges from about 50 to about 1500R is selected from the group consisting of phenyl and C1 to C4 alkyl substituted phenyl;K is selected from the group consisting of ##STR2## --S--, --O--, and --CH2 --, or is absent; P and P1 are selected from the group consisting of C1 to C4 alkyl, methoxy, ethoxy, butoxy, and H; andP1 may be the same as P or different.Field of SearchPolymeric diazonium compoundPost image treatment to produce elevated pattern Including heating Finishing or perfecting composition or product Process of making diazo product Using specific adjuvant other than radiation-sensitive diazo compound Diazonium salt with anion specified Polymeric mixture Diazonium compound containing layer Lithographic Chemical modification utilizing a chemical treating agent Polymer derived from acrylic or methacrylic esters, or vinyl acetate monomer Nitrogen containing chemical treating agent Nitrogen-containing compound has at least one nitrogen-to-nitrogen bond Diazo or diazonium (e.g., -N=N-C, etc.) With preservative or stabilizer Hetero ring containing Plural diazo or diazonium groups Heavy metal or aluminum containing Polycyclo ring system having at least three cyclos Aldehyde or ketone group containing Formation of diazonium group |
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