Exposure method and projection exposure apparatus
March 3, 2012. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesOptical projection and scanning apparatus Horizontal position detecting device Step-and-repeat alignment and exposure system Step-and-repeat alignment and exposure system Optical relay system with magnification Stage device with levelling mechanism Method of forming pattern and projection aligner for carrying out the same Device for detecting the levelling of the surface of an object Scan and repeat high resolution projection lithography system Patent #: 4924257 InventorAssigneeApplicationNo. 845065 filed on 03/03/1992US Classes:355/53, Step and repeat355/55Focus or magnification controlExaminersPrimary: Wintercorn, Richard A.Attorney, Agent or FirmInternational ClassG03B 027/42Foreign Application Priority Data1991-03-06 JPAbstractA projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction of one-dimensional movement. The substrate is also moved in a direction of optical axis of projection optical system when moved in the direction of one-dimension, such that a central part of transfer area on the substrate is located on a best focal plane of projection optical system upon scan exposure.Other References
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