Patent ReferencesRadiation measurement of a product temperature in a furnace Emissivity correction apparatus and method Method for measuring surface temperature of semiconductor wafer substrate, and heat-treating apparatus Emissivity calibration apparatus and method Pyrometer apparatus and method Wafer heating and monitor module and method of operation Bichannel radiation detection method Patent #: 5114242 InventorsAssigneeApplicationNo. 756536 filed on 09/09/1991US Classes:374/121, By thermally emitted radiation356/45, Plural color responsive374/127, Having significant frequency limitation or relationship (e.g., peak, ratio)374/128, Having significant signal handling circuitry (e.g., linearizing, emissivity compensation)374/133Ambient temperature compensated (e.g., dummy sensor)ExaminersPrimary: Cuchlinski, William A. Jr.Assistant: Gutierrez, Diego Attorney, Agent or FirmForeign Patent References
International ClassG01J 005/06AbstractDual pyrometric detectors and method measure the temperature of a remote heated object in the presence of ambient radiation. One detector measures emitted radiation from both the remote object and from the environment, and the other detector measures radiation predominantly from the environment alone. The output signals from the two detectors are processed electronically to yield the detected radiation from the remote object alone. The result can then be electronically processed to display the pyrometrically-measured temperature of the remote object.Field of SearchTransparent material measurement or compensation (e.g., spectral line, gas, particulate suspensionHaving emissivity compensating or specified radiating surface Having significant frequency limitation or relationship (e.g., peak, ratio) Having significant signal handling circuitry (e.g., linearizing, emissivity compensation) Ambient temperature compensated (e.g., dummy sensor) By thermally emitted radiation Plural color responsive | |