U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Wave front aberration measuring apparatus

Patent 5157459 Issued on October 20, 1992. Estimated Expiration Date: Icon_subject August 29, 2010. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Keratometer
Patent #: 4355871
Issued on: 10/26/1982
Inventor: Nevyas ,   et al.

Apparatus for maintaining adjustment of coincidence and relative phase relationship of light beams in an interferometer
Patent #: 4379633
Issued on: 04/12/1983
Inventor: Bickel ,   et al.

Apparatus for reading information
Patent #: 4553229
Issued on: 11/12/1985
Inventor: Wakamiya

Direct slope measurement shearing interferometer Patent #: 4660978
Issued on: 04/28/1987
Inventor: Wu

Inventors

Assignee

Application

No. 574071 filed on 08/29/1990

US Classes:

356/520Having shearing

Examiners

Primary: Turner, Samuel A.
Assistant: Kurtz, Richard

Attorney, Agent or Firm

Foreign Patent References

  • 61-109015 JP. 05/13/1986

International Class

G01B 009/02

Foreign Application Priority Data

1989-08-29 JP

Abstract

An apparatus for measuring a wave front aberration including a light beam splitter for dividing a parallel laser light beam incident from a measuring object into two beam fluxes, an image rotator disposed in at least one optical path of the divided beam fluxes for rotating the wave from on the optical axis, an interference device for interfering, after superposing the beam fluxes, whose wave fronts are rotated relatively, an imaging lens for forming the interfered beam into an image, and an observation device for observing the imaged interference fringes.

Other References

  • Copy of the English Language abstract for Japanese Patent No. 61-109015
  • Copy of the Hitachi Central Research Article 13a-E-5
  • Copy of the Matsushita Denki Central Research Institute Article 13p-E-10
  • Copy of the Hitachi Central Research Article 13p-E-12
  • Copy of the Optical Shop Testings, pp. 165-17
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