Cleaning brush for semiconductor wafer
Patent 5144711 Issued on September 8, 1992. Estimated Expiration Date: 
March 25, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
March 25, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2530530 3150401 Automatic barbecue-grille cleaner Method for cleaning article by scrubbing with cleaning roll Apparatus for washing opposite surfaces of a substrate Cleaning apparatus having a contact buffer apparatus Patent #: 4935981 InventorAssigneeApplicationNo. 674594 filed on 03/25/1991US Classes:15/97.1, Wiping15/21.1, Brushing15/77, Sheet, bar, and plate cleaners15/88.2Work moves past rotatable brushExaminersPrimary: Roberts, Edward L.Attorney, Agent or FirmInternational ClassB08B 011/02AbstractApparatus for cleaning an offset semiconductor wafer includes first and second opposed brushes circumscribing a common drive shaft. The wafer includes a circular peripheral edge. At any given instant, a first portion of the offset semiconductor wafer is positioned between and contacts the brushes while the second remaining portion of the semiconductor wafer extends outwardly from between the brushes. The peripheral edge of the second portion of the wafer contacts and is turned by a rotating support member. | |
