Lithography system employing a solid immersion lens
Patent 5121256 Issued on June 9, 1992. Estimated Expiration Date: 
March 14, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
March 14, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3556659 Front lens group for immersion microscope objective in BD versions of high aperture Transmitted-light illuminating arrangement for a microscope Patent #: 5032011 InventorsAssigneeApplicationNo. 669200 filed on 03/14/1991US Classes:359/664, Spherical250/492.2, Irradiation of semiconductor devices359/356, Infrared lens359/508, Optical element rotates359/661Having less than four componentsExaminersPrimary: Ben, LohaAttorney, Agent or FirmInternational ClassG02B 007/02AbstractA lithography system employing a solid immersion lens having a spherical surface to enhance its resolution is disclosed.Field of SearchHaving less than four componentsSpherical Lens mounts With axial adjustment (e.g., adjustable focus, etc.) With rotating or pivoting element (e.g., scanning discs) Element rotates about axis perpendicular to light path Optical element rotates Microscope drape Infrared lens Electron probe type Irradiation of semiconductor devices | |
