U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

DC reactively sputtered antireflection coatings

Patent 5105310 Issued on April 14, 1992. Estimated Expiration Date: Icon_subject October 11, 2010. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

2478385

3432225

3565509

3604784

3781090

Anti-reflection coating having pseudo-inhomogeneous layers
Patent #: 3960441
Issued on: 06/01/1976
Inventor: Kamiya ,   et al.

Direct current liquid crystal display with highly reflecting dielectric mirror
Patent #: 4012119
Issued on: 03/15/1977
Inventor: Adams ,   et al.

Nonreflective coating
Patent #: 4313647
Issued on: 02/02/1982
Inventor: Takazawa

Ultraviolet reflecting mirror
Patent #: 4714308
Issued on: 12/22/1987
Inventor: Sawamura ,   et al.

Multi-layered antireflection film preventing reflection at two wavelength regions
Patent #: 4997241
Issued on: 03/05/1991
Inventor: Muratomi

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Inventor

Assignee

Application

No. 595552 filed on 10/11/1990

US Classes:

359/586, Layers having specified index of refraction204/192.26, Optical or photoactive359/581, By transmissive coating on lens359/589Selective wavelength transmission or reflection

Examiners

Primary: Arnold, Bruce Y.
Assistant: Ryan, J. P.

Attorney, Agent or Firm

International Class

G02B 001/10

Abstract

A multilayer antireflection coating designed for deposition in in-line coating machines by DC reactive sputtering. About half of the total thickness of the coating may be formed from zinc oxide which has a high sputtering rate.

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