Activated gas generator
Ion generating apparatus and method for the use thereof
Plasma processing apparatus Patent #: 4831963
ApplicationNo. 302244 filed on 01/27/1989
US Classes:427/575, Generated by microwave (i.e., 1mm to 1m)118/723MR, With magnet (e.g., electron cyclotron resonance, etc.)219/686, Gas environment (e.g., pressurized, etc.)219/696, With tuning315/39, Discharge device load with distributed parameter-type transmission line (e.g., wave-guide, coaxial cable)315/111.21Plasma generating
ExaminersPrimary: Beck, Shrive
Assistant: Owens, Terry J.
Attorney, Agent or Firm
Foreign Patent References
International ClassC23C 016/50
Foreign Application Priority Data1988-02-01 JP
AbstractA microwave plasma CVD apparatus includes a hermetically sealed vacuum vessel, a device for evacuating the vacuum vessel, and a device for introducing microwaves through a microwave transmission circuit into the vacuum vessel to produce a plasma within the vacuum vessel. The microwave transmission circuit includes a cavity resonator integrally provided with two matching circuits, one of which is a plunger for varying the length of the cavity resonator and the other of which is a pair of sliding matching irises. Feedback in the apparatus can be controlled by driving one of the matching circuits for rough matching of the microwave impedance and driving the other matching circuit for fine matching of the microwave impedance, so that the calculated ratio of the reflected power to the input power, based on a signal from a power monitor, is reduced to a minimum.