Dense phase gas photochemical process for substrate treatment
April 3, 2009. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesOxidation of refractory organics in aqueous waste streams by hydrogen peroxide and ultraviolet light Apparatus for sanitizing liquids with ultra-violet radiation and ozone Process for renewing the adsorptive capacity of a bed of active carbon Method and apparatus for treating water Treatment of waste compositions Method of treating contaminated insoluble organic solid material Method and apparatus for the generation and utilization of ozone and singlet oxygen Method for pollution control in photographic processing Process for treatment of organic contaminants in solid or liquid phase wastes Patent #: 4793931 InventorApplicationNo. 332124 filed on 04/03/1989US Classes:210/748, Utilizing electrical or wave energy (directly applied to liquid or material being treated)134/1, Including application of electrical radiant or wave energy to work134/31, Gas or vapor condensation or absorption oowork210/760Utilizing ozoneExaminersPrimary: Wyse, Thomas G.Attorney, Agent or FirmInternational ClassesC02F 001/32C02F 001/78 B08B 003/12 AbstractA process for removing undesired material from a chosen substrate by exposing the substrate simultaneously to ultraviolet radiation and a selected dense fluid, wherein the radiation produces a photochemical reaction that removes the undesired material from the substrate and the dense fluid enhances the removal of the undesired material. In an alternative embodiment, a reactive agent may additionally be used. The process may be used to remove contaminants from a substrate, etch a substrate surface, or destroy toxic organic material in industrial wastes.Field of SearchUtilizing electrical or wave energy (directly applied to liquid or material being treated)Utilizing ozone Including application of electrical radiant or wave energy to work For metallic, siliceous, or calcareous basework, including chemical bleaching, oxidation or reduction Including steam, gaseous agent or temperature feature Gas or vapor condensation or absorption oowork Gas or vapor blasts or currents Miscellaneous | |
