U.S. patents available from 1976 to present.
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Intelligent mass flow controller

Patent 5062446 Issued on November 5, 1991. Estimated Expiration Date: Icon_subject January 7, 2011. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Method for controllably positioning a solenoid plunger
Patent #: 4813443
Issued on: 03/21/1989
Inventor: Pounder

Computer aided tuning of turbine controls
Patent #: 4866940
Issued on: 09/19/1989
Inventor: Hwang ,   et al.

Air flow metering terminal and control system
Patent #: 4873873
Issued on: 10/17/1989
Inventor: Day

Diagnostic apparatus and method for fluid control valves Patent #: 4976144
Issued on: 12/11/1990
Inventor: Fitzgerald

Inventor

Application

No. 638279 filed on 01/07/1991

US Classes:

137/468, Thermal responsive137/486, Responsive to change in rate of fluid flow137/487.5Electrically actuated valve

Examiners

Primary: Cohan, Alan

Attorney, Agent or Firm

International Class

G05D 007/06

Abstract

An intelligent mass flow controller for controlling the mass flow of gas to a semiconductor processing chamber. A sensing circuit measures a difference in temperature across a sensing tube and translates this difference to adjust a valve for controlling the mass flow. A microcontroller which includes a CPU, signal processing and software routines continually monitors the various parameters and provide "on the fly" corrections, as well as providing diagnostics and record retention.

Other References

  • The Journal of Vacuum Science and Technology, May/Jun. 1990, "Toward Understanding the Fundamental Mechanisms and Properties of the Thermal Mass Flow Controller", L. D. Hinkle, C. F. Mariano
  • Sierra Instruments Brochure, 1987, "Process Gas Mass Flow Controllers and Meters", Sierra's Side-Trak™, Series 840 and 830
  • Journal of Scientific Instruments, 1968, "Thermal Methods of Flow Measurement", Series 2, vol. 1, P. Bradshaw
  • IEEE Transactions on Instrumentation, Dec. 1974, "Standard Cell Enclosure with 20 -μK Stability", vol. IM-23, No. 4; Robert Cutkosky, B. Field
  • Semiconductor International, Sep. 1988, "Watch Your Vacuums and RF by PC to Make Your Process Repeatable," Brian Chapman et al
  • Control Engineering, May 1985, "Thermal Mass Flowmeters", pp. 150-158, Brian C. Water
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