U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Nonvolatile semiconductor memory having three dimension charge confinement

Patent 5055890 Issued on October 8, 1991. Estimated Expiration Date: Icon_subject January 25, 2010. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Lateral confinement of charge carriers in a multiple quantum well structure
Patent #: 4683484
Issued on: 07/28/1987
Inventor: Derkits, Jr.

Double heterojunction semiconductor device with injector
Patent #: 4727403
Issued on: 02/23/1988
Inventor: Hida ,   et al.

Heterojunction field effect transistor
Patent #: 4748484
Issued on: 05/31/1988
Inventor: Takakuwa ,   et al.

Floating gate memories Patent #: 4905063
Issued on: 02/27/1990
Inventor: Beltram, et al.

Inventors

Assignee

Application

No. 469995 filed on 01/25/1990

US Classes:

257/192, Field effect transistor257/278, With devices vertically spaced in different layers of semiconductor material (e.g., "3-dimensional" integrated circuit)257/280, With Schottky gate257/287, With multiple channels or channel segments connected in parallel, or with channel much wider than length between source and drain (e.g., power JFET)257/513, Vertical walled groove257/E29.316, Programmable transistor (e.g., with charge-trapping quantum well) (EPO)257/E29.317With Schottky gate (EPO)

Examiners

Primary: James, Andrew J.
Assistant: Van Ngo, Ngan

Attorney, Agent or Firm

Foreign Patent References

  • 0171531 EP 02/13/1986
  • 63-229761 JP 09/13/1988
  • 8808617 WO 11/13/1988

International Classes

H01L 029/161
H01L 029/80
H01L 029/34

Abstract

A layered semiconductor device with a nonvolatile three dimensional memory comprises a storage channel which stores charge carriers. Charge carriers flow laterally through the storage channel from a source to a drain. Isolation material, either a Schottky barrier or a heterojunction, located in a trench of an upper layer controllably retains the charge within the a storage portion determined by the confining means. The charge is retained for a time determined by the isolation materials' nonvolatile characteristics or until a change of voltage on the isolation material and the source and drain permit a read operation. Flow of charge through an underlying sense channel is affected by the presence of charge within the storage channel, thus the presences of charge in the memory can be easily detected.

Other References

  • S. Sze, Physics of Semiconductor Devices, 2nd Ed., John Wiley & Sons, 1981, pp. 496-507
  • F. Capasso et al., "New Floating-Gate AlGaAs/GaAs Memory Devices with Graded-Gap Electron Injector and Long Retention Times", IEEE Electron Device Letters, vol. 9, No. 8, Aug. 1988, pp. 377-379
  • J. Cooper, Jr. et al., "Capacitance-Voltage and Current-Voltage Characteristics of Molecular Beam Epitaxially Grown p+-GaAs/AlAs/n-GaAs HeteroStructures", Applied Physics Letters, vol. 48, No. 5, Feb. 3, 1986, pp. 365-366
  • J. Cooper, Jr. et al., "Evidence of Long-Term Storage of Minority Carriers In N+-GaAs/AlGaAs/P-GaAs MIS Capacitors", IEEE Electron Device Letters, vol. EDL-7, No. 6, Jun. 1986, pp. 374-376
  • M. Melloch et al., "Effect of a Buried Superlattice on the Dynamic Storage of Electrons at the AlGaAs/GaAs Heterojunction", Applied Physics Letters, vol. 50, No. 23, Jun. 8, 1987, pp. 1657-1658
  • D. Delagebeaudeuf et al., "Metal-(n) AlGaAs-GaAs Two-Dimensional Electron Gas FET", IEEE Transactions On Electron Devices, vol. ED-29, No. 6, Jun. 1982, pp. 955-96
PatentsPlus Images
Enhanced PDF formats
loading...
PatentsPlus: add to cart
PatentsPlus: add to cartSearch-enhanced full patent PDF image
$9.95more info
PatentsPlus: add to cart
PatentsPlus: add to cartIntelligent turbocharged patent PDFs with marked up images
$18.95more info
 
Sign InRegister
Username  
Password   
forgot password?