Microwave induced plasma torch with tantalum injector probe
June 7, 2009. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3296410 3432296 Seeded flame microwave power load Apparatus for treating powdery materials utilizing microwave plasma Plasma generator Electron cyclotron resonance negative ion source Inductively coupled helium plasma torch Trace element spectrometry with plasma source Microwave plasma production apparatus Patent #: 4933650 InventorAssigneeApplicationNo. 362357 filed on 06/07/1989US Classes:219/121.52, Electrode structure219/121.48, Plasma torch structure219/121.51, Gas supply system250/288, With sample supply means315/111.21Plasma generatingExaminersPrimary: Paschall, Mark H.Attorney, Agent or FirmInternational ClassB23K 009/00AbstractA stable, low gas-flow microwave induce plasma torch for use with a helium microwave induced plasma system provides a toroidal plasma with central analyte injection obtained by the addition of a tantalum coupling probe injector. This, injector which penetrates through 100% of the total cavity depth, aids in plasma initiation, in the efficiency of power transfer to the cavity, and in eliminating the effects of a lack of homogeneity in the microwave field on analyte distribution in the plasma. In the preferred embodiment the microwave induced plasma torch includes a stainless steel body, a threaded aluminum insert, a PTFE insulator, a tantalum injector probe, and a quartz containment tube. | |
