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US Patent 5031674 - Fluid flow control method and apparatus for minimizing particle contamination
US Patent Issued on July 16, 1991
Estimated Patent Expiration Date:
September 21, 2010Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
Estimated Patent Expiration Date:
September 21, 2010Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.AbstractA fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber but are not high enough to dislodge particulate contaminate from the process chamber walls. In the disclosed design, the invention has utility both in instances in which wafers are directly inserted into the process chamber for ion implantation and in which the wafers are inserted into the chamber by use of a load-lock which avoids the requirement that the process chamber be cyclicly pressurized and depressurized. | InventorApplicationNo. 585914 filed on 09/21/1990US Classes:141/66, With filling with gas137/14, Involving pressure control137/487.5, Electrically actuated valve141/8, Vacuum250/492.2Irradiation of semiconductor devicesField of Search141/78, Agitating means associated with receiver conveyer141/37, DIVERSE FLUID CONTAINING PRESSURE FILLING SYSTEMS INVOLVING RECEIVER GAS CONTENT MODIFICATION141/65, EVACUATION APPARATUS141/66, With filling with gas141/98, COMBINED137/14, Involving pressure control137/486, Responsive to change in rate of fluid flow137/487.5, Electrically actuated valve600/21, ISOLATION TREATMENT CHAMBERS250/492.21, Ion bombardment414/217, APPARATUS FOR MOVING MATERIAL BETWEEN ZONES HAVING DIFFERENT PRESSURES AND INHIBITING CHANGE IN PRESSURE GRADIENT THEREBETWEEN414/221Including serially arranged valves in path having a vertical component (e.g., airlocks, etc.)ExaminersPrimary: Recla, Henry J.Assistant: Jacyna, Casey Attorney, Agent or FirmUS Patent References3724874, 3962726, Self-clocking magnetic record sensing systemIssued on: 06/08/1976 Inventor: De Land, Jr.4181161, Method of producing a high vacuum in a container Issued on: 01/01/1980 Inventor: Kraus4680474, Method and apparatus for improved ion dose accuracy Issued on: 07/14/1987 Inventor: Turner , et al.4739787, Method and apparatus for improving the yield of integrated circuit devices Issued on: 04/26/1988 Inventor: Stoltenberg4797054, Apparatus for loading and unloading a vacuum processing chamber Issued on: 01/10/1989 Inventor: Arii4836233Method and apparatus for venting vacuum processing equipment Issued on: 06/06/1989 Inventor: Milgate, III International ClassesG05D 016/00F16K 024/04 |
