Fluid flow control method and apparatus for minimizing particle contamination
Patent 5031674 Issued on July 16, 1991. Estimated Expiration Date: 
September 21, 2010. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
September 21, 2010. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3724874 Self-clocking magnetic record sensing system Method of producing a high vacuum in a container Method and apparatus for improved ion dose accuracy Method and apparatus for improving the yield of integrated circuit devices Apparatus for loading and unloading a vacuum processing chamber Method and apparatus for venting vacuum processing equipment Patent #: 4836233 InventorApplicationNo. 585914 filed on 09/21/1990US Classes:141/66, With filling with gas137/14, Involving pressure control137/487.5, Electrically actuated valve141/8, Vacuum250/492.2Irradiation of semiconductor devicesExaminersPrimary: Recla, Henry J.Assistant: Jacyna, Casey Attorney, Agent or FirmInternational ClassesG05D 016/00F16K 024/04 AbstractA fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber but are not high enough to dislodge particulate contaminate from the process chamber walls. In the disclosed design, the invention has utility both in instances in which wafers are directly inserted into the process chamber for ion implantation and in which the wafers are inserted into the chamber by use of a load-lock which avoids the requirement that the process chamber be cyclicly pressurized and depressurized.Field of SearchAgitating means associated with receiver conveyerDIVERSE FLUID CONTAINING PRESSURE FILLING SYSTEMS INVOLVING RECEIVER GAS CONTENT MODIFICATION EVACUATION APPARATUS With filling with gas COMBINED Involving pressure control Responsive to change in rate of fluid flow Electrically actuated valve ISOLATION TREATMENT CHAMBERS Ion bombardment APPARATUS FOR MOVING MATERIAL BETWEEN ZONES HAVING DIFFERENT PRESSURES AND INHIBITING CHANGE IN PRESSURE GRADIENT THEREBETWEEN Including serially arranged valves in path having a vertical component (e.g., airlocks, etc.) | |
