U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Metalization systems for heater/sensor elements

Patent 5006421 Issued on April 9, 1991. Estimated Expiration Date: Icon_subject September 30, 2008. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

H546

3540920

3664874

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Patent #: 4127840
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Method of preparing high-temperature-stable thin-film resistors
Patent #: 4391846
Issued on: 07/05/1983
Inventor: Raymond

Reactively sputtered chrome silicon nitride resistors
Patent #: 4569742
Issued on: 02/11/1986
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Low power gas detector
Patent #: 4580439
Issued on: 04/08/1986
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Thin film chromium-silicon-carbon resistor
Patent #: 4682143
Issued on: 07/21/1987
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Thermal head and method for fabrication thereof
Patent #: 4701769
Issued on: 10/20/1987
Inventor: Nishiguchi ,   et al.

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Inventors

Assignee

Application

No. 257074 filed on 09/30/1988

US Classes:

428/641, Ge- or Si-base component338/308, Resistance element coated on base428/615, Composite; i.e., plural, adjacent, spatially distinct metal components (e.g., layers, joint, etc.)428/660, Refractory (Group IVB, VB, or VIB) metal-base component428/661, Diverse refractory group metal-base components: alternative to or next to each other428/664, Alternative to or next to each other428/669Group IB metal-base component alternative to platinum group metal-base component (e.g., precious metal, etc.)

Examiners

Primary: Zimmerman, John J.

Attorney, Agent or Firm

Foreign Patent References

  • 283504 AU 10/13/1966
  • 0016263 EP. 01/13/1980
  • 3814432 DE 11/13/1988
  • 50-88529 JP 07/13/1975
  • 1152683 GB 05/13/1969
  • 2181298A GB. 04/13/1986

International Class

H01C 007/02

Abstract

Device comprising a substrate and a metallized sensor/heater element having a temperature coefficient of resistance of at least 2000 parts per million. Methods of fabricating the devices are also disclosed.

Other References

  • Lee et al, "Silicon Micromachining Technology . . . " SAE Technical Papers, pp. 1-10
  • Allan, Roger, "Sensors in Silicon", High Technology/Sep. 1984, pp. 43-77
  • Collins et al, "Tantalum and Cobalt Silicides: Temperature Sensor Applications", Applied Physics A. Solids & Surfaces, vol. A40, No. 2, Jun. 1986, pp. 109-11
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