Wafer rinser/dryer
June 21, 2010. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3893867 Apparatus and method for cleaning wafers Applying photoresist onto silicon wafers Apparatus for processing articles in a series of process solution containers Hybrid solar/combustion powered receiver Machine and method for stripping photoresist from wafers Method and apparatus for quantitative measurement of organic contaminants remaining on cleaned surfaces Apparatus and process for static drying of substrates Patent #: 4816081 InventorsApplicationNo. 541642 filed on 06/21/1990US Classes:134/58R, Electrically controlled134/99.1, Plural fluids applying conduits134/102.3, With drying means134/113, With alarm, signal, indicating, testing, inspecting, illuminating or display means134/115R, Combined or convertible134/147, With movable work support and separate movable means to cause fluid motion (e.g., pump, splasher, agitator)134/151, With spray or jet applying conduits or nozzles134/200, With closable work-treating chambers134/902SEMICONDUCTOR WAFERExaminersPrimary: Stinson, Frankie L.Attorney, Agent or FirmInternational ClassB08B 003/02AbstractImprovements to an integrated circuit wafer rinsing and washing machine which include a streamlined housing for low turbulence air flow, improved rear maintenance capability, improved wafer carriers, foot operated switches and improved rotating part fastening means.Field of SearchWith work immersing meansWith electric control With work feeding and/or discharging means Electrically controlled By crystallizing, precipitating, or eliminating dissolved solids from used agent With alarm, signal, indicating, testing, inspecting, illuminating or display means With movable work support and separate movable means to cause fluid motion (e.g., pump, splasher, agitator) With movable means to cause fluid motion (e.g., pump, splasher, agitator) With closable work-treating chambers Movably mounted work holder operable by fluid contact Motor operated apparatus With spray or jet applying conduits or nozzles MACHINES | |
