Photoresist stripping compositions

Patent 4992108 Issued on February 12, 1991. Estimated Expiration Date:

January 18, 2010. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

Method for stripping photolacquers
Patent #: 4070203
Issued on: 01/24/1978
Inventor: Neisius , et al.

Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
Patent #: 4165294
Issued on: 08/21/1979
Inventor: Vander Mey

Organic stripping compositions and method for using same
Patent #: 4165295
Issued on: 08/21/1979
Inventor: Vander Mey

Organic stripping compositions and method for using same
Patent #: 4215005
Issued on: 07/29/1980
Inventor: Vander Mey

Organic sulfonic acid stripping composition and method with nitrile and fluoride metal corrosion inhibitor system
Patent #: 4221674
Issued on: 09/09/1980
Inventor: Vander Mey

Phenol-free photoresist stripper
Patent #: 4242218
Issued on: 12/30/1980
Inventor: Vander Mey

Photoresist stripping composition and method
Patent #: 4395348
Issued on: 07/26/1983
Inventor: Lee

Brown stain suppressing phenol free and chlorinated hydrocarbons free photoresist stripper
Patent #: 4491530
Issued on: 01/01/1985
Inventor: Thomas

Thermal optical modulation method and device using alternating current
Patent #: 4881798
Issued on: 11/21/1989
Inventor: Yuasa, et al.

Remover solution for resist Patent #: 4944893
Issued on: 07/31/1990
Inventor: Tanaka, et al.

Inventors

Application

No. 466758 filed on 01/18/1990

US Classes:

134/38, Paints, varnishes, lacquers, or enamels, removal430/329, Removal of imaged layers510/176, For stripping photoresist material510/407, Nonaqueous liquid510/414Sulfur containing anionically substituted surfactant

Examiners

Primary: Chaudhuri, Olik
Assistant: Ojan, Ourmazd S.

Attorney, Agent or Firm

Lezdey; John

International Classes

C11D 001/12
C23G 001/02

Abstract

A non-aqueous biodegradable negative photoresist stripping composition having low toxicity and is operable at temperatures at 85° C. or less which comprises about 85% by weight of an aromatic hydrocarbon solvent of the formula selected from the group consisting of: ##STR1## wherein R1 and R2 are the same or different and each is a member selected from the group consisting of methyl, ethyl n-propyl and isopropyl, and an organic sulfonic acid of the formula:R3 --SO3 Hwherein R3 is a member selected from the group consisting of phenyl, tolyl, dodecylbenzene and naphthyl, the ratio of the aromatic solvent to organic solvent acid being about 60 to 96% by weight to about 4 to 40% by weight.