Patent ReferencesApparatus for producing metal oxide films Composite pallet Magnetron cathode sputtering apparatus Shaped field magnetron electrode Wafer coating system Patent #: 4756815 InventorsAssigneeApplicationNo. 513763 filed on 04/24/1990US Classes:204/298.06, Triode, tetrode, auxiliary electrode or biased workpiece204/298.09, Specified cooling or heating204/298.11, Specified mask, shield or shutter204/298.15, Specified work holder204/298.23Moving workpiece or targetExaminersPrimary: Nguyen, NamAttorney, Agent or FirmInternational ClassC23C 014/34Foreign Application Priority Data1989-04-28 JPAbstractA thin film deposition system for depositing a thin film on a substrate by sputtering is characterized in that a substrate holder for holding thereon the substrate is transferred by a transfer mechanism from or to a film deposition position to or from another position such as another chamber different from the film deposition chamber, an electrode for applying bias voltage of radio frequency to the substrate or substrate holder is axially movable relatively to the substrate holder so that the electrode can be contacted with or discontact from the substrate holder, and a grounded shield is provided so as to cover the electrode and the substrate holder with a gap thereby shielding radio frequency from the electrode and the substrate holder to prevent formation of glow discharge between a wall of the vacuum chamber and the electrode or the substrate holder.Field of SearchGlow discharge sputter deposition (e.g., cathode sputtering, etc.)Triode, tetrode, auxiliary electrode or biased workpiece Specified cooling or heating Specified mask, shield or shutter Specified work holder Moving workpiece or target Multi-chamber (e.g., including air lock, load/unload chamber, etc.) Plural diverse treatment stations, zones, or coating material source within single chamber |
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