Patent References 1912547 2689411 2825142 3617126 3626600 Positioning device for a flat rectangular workpiece Multidirectional translator mechanism Ultra-precision two-dimensional moving apparatus Microlithographic reticle positioning system Patent #: 4667415 InventorsApplicationNo. 030009 filed on 03/25/1987US Classes:33/621, Plate registration with respect to plate support33/623, Sheet registering device33/645AlignmentExaminersPrimary: Haroian, Harry N.Attorney, Agent or FirmInternational ClassB41B 011/00AbstractA reticle frame for precisely holding a reticle or mask used in photolithography with a minimum of distortion. A plurality of adjusting screws are used to accurately position the reticle within the frame. Transversely compliant axial loading springs opposing the adjusting screws reduce the bending forces acting on the reticle. Precision balls are used to establish a plane for the reticle further reducing bending forces thereon causing less distortion and thereby proving greater resolution when the reticle image is reproduced on a semiconductor wafer.Field of SearchWork support adjustmentCollocating Printing member registration Photographic member or holder with respect to surface Printing type or plate Plate registration with respect to plate support Sheet registering device Alignment X-Y motion Screw means Resiliently urged abutment Plural spaced abutment surfaces | |