Patent References 3227619 3309284 3629068 3868593 3878479 Fission fragment excited laser system Gas laser with sputter-resistant cathode Patent #: 4017808 InventorAssigneeApplicationNo. 357248 filed on 05/26/1989US Classes:376/221, Variable fluent reflector/moderator level or density376/326, With laser376/331Gaseous control componentExaminersPrimary: Behrend, Harvey E.Attorney, Agent or FirmForeign Patent References
International ClassG21C 007/06AbstractA control element for reactivity control of a fission source provides an atomic density of 3 He in a control volume which is effective to control criticality as the 3 He is spin-polarized. Spin-polarization of the 3 He affects the cross section of the control volume for fission neturons and hence, the reactivity. An irradiation source is directed within the 3 He for spin-polarizing the 3 He. An alkali-metal vapor may be included with the 3 He where a laser spin-polarizes the alkali-metal atoms which in turn, spin-couple with 3 He to spin-polarize the 3 He atoms.Other References
| |