Method of ionized-plasma spraying and apparatus for performing same Patent #: 4606929
ApplicationNo. 323560 filed on 03/14/1989
US Classes:204/298.07, Specified gas feed or withdrawal204/298.25Multi-chamber (e.g., including air lock, load/unload chamber, etc.)
ExaminersPrimary: Weisstuch, Aaron
Attorney, Agent or Firm
International ClassC23C 014/34
AbstractThe apparatus for applying film coatings onto substrates in vacuum comprises a vacuum working chamber with a holder of substrates and magnetron material sputtering units, an evacuation chamber equipped with magnetron pump and communicating with a gas source, a pre-evacuation pump, an auxiliary evacuation chamber with a magnetron pump, an auxiliary gas source and a system of conduits. The system includes a conduit equipped with a control valve, communicating the auxiliary gas source with the auxiliary evacuation chamber, and two conduits each with its control valve, communicating the respective gas sources with the working chamber.