U.S. patents available from 1976 to present.
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Apparatus for applying film coatings onto substrates in vacuum

Patent 4961832 Issued on October 9, 1990. Estimated Expiration Date: Icon_subject March 14, 2009. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3484358

3691053

Method of ionized-plasma spraying and apparatus for performing same Patent #: 4606929
Issued on: 08/19/1986
Inventor: Petrakov ,   et al.

Inventors

Application

No. 323560 filed on 03/14/1989

US Classes:

204/298.07, Specified gas feed or withdrawal204/298.25Multi-chamber (e.g., including air lock, load/unload chamber, etc.)

Examiners

Primary: Weisstuch, Aaron

Attorney, Agent or Firm

International Class

C23C 014/34

Abstract

The apparatus for applying film coatings onto substrates in vacuum comprises a vacuum working chamber with a holder of substrates and magnetron material sputtering units, an evacuation chamber equipped with magnetron pump and communicating with a gas source, a pre-evacuation pump, an auxiliary evacuation chamber with a magnetron pump, an auxiliary gas source and a system of conduits. The system includes a conduit equipped with a control valve, communicating the auxiliary gas source with the auxiliary evacuation chamber, and two conduits each with its control valve, communicating the respective gas sources with the working chamber.

Other References

  • "Technology of Magnetron Spraying for Producing Thin Films for Electronic Industry", Leybold-Heraeus Co., German
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