Semiconductor substrate heater and reactor process and apparatus
Patent 4938815 Issued on July 3, 1990. Estimated Expiration Date: 
October 14, 2008. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
October 14, 2008. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 2897331 3083286 3391270 3505499 3536893 3623712 3673785 3815575 Electrical fluid heater Epitaxial radiation heated reactor InventorApplicationNo. 257854 filed on 10/14/1988US Classes:118/726, Crucible or evaporator structure117/101, Characterized by specified crystallography or arrangement of substrate (e.g., wafer cassette, Miller index)118/500, WORK HOLDERS, OR HANDLING DEVICES118/725, Substrate heater118/728, Work support219/385, Combined with container, enclosure, or support for material to be heated219/399, With heat energy transfer, distribution, or accumulator means219/430, With heat storage or transfer means219/439, With heat storage or transfer means219/444.1, Material is an electronic semiconductor device219/449.1, Heating by convection219/521, Including or comprising holding or support means for material to be heated219/530, With heat storage or transfer means (vanes)219/540, With heat storage or transfer means (e.g., fins or plate)257/E21.252By dry-etching (EPO)ExaminersPrimary: Pal, AsokAttorney, Agent or FirmForeign Patent References
International ClassesC30B 023/02C30B 025/10 AbstractA semiconductor substrate heater process and apparatus are disclosed for uniformly heating semiconductor substrates. A device for supporting the back side of an IC wafer in a reaction chamber and for conduction heating therein and auxiliary heat directed to the front side of the substrate by reflection from the inside surface of the reaction chamber and/or by an auxiliary heating source within the reaction chamber are disclosed.Other References
Field of SearchSubstrate heaterWork support WORK HOLDERS, OR HANDLING DEVICES Gripper or clamped work type COATING BY VAPOR, GAS, OR SMOKE Combined with container, enclosure, or support for material to be heated With heat energy transfer, distribution, or accumulator means With heat storage or transfer means With heat storage or transfer means Including or comprising holding or support means for material to be heated With heat storage or transfer means (vanes) With heat storage or transfer means (e.g., fins or plate) Insertable into or in direct contact with heated material Housing, casing, or support insertable into material or space to be heated (e.g., immersion type) | |
