Patent ReferencesProcess for chemically bonding a poly-p-xylylene to a thermosetting resin and article produced thereby Process for forming polymeric paraxylylene coatings and films possessing improved oxidation resistance Electrets Patent #: 4291245 InventorsAssigneeApplicationNo. 109079 filed on 10/16/1987US Classes:427/488, Plasma initiated polymerization257/E21.505, Insulative mounting semiconductor device on support (EPO)427/96.6, Barrier to diffusion of specific fluid (e.g., silicone rubber, selectively permeable membrane which excludes water or moisture, etc.)427/96.8, Vapor or gas deposition427/255.4, Base supplied constituent427/255.7, Plural coatings applied by vapor, gas, or smoke427/294, VACUUM UTILIZED PRIOR TO OR DURING COATING427/407.1, Synthetic resin coating427/495, Polymerization involving the control of oxygen containing gas as an inhibitor (e.g., air, etc.)427/570Utilizing plasma with other nonionizing energy sourcesExaminersPrimary: Pianalto, BernardAttorney, Agent or FirmForeign Patent References
International ClassB05D 003/06AbstractA process for applying an adherent electrically insulative moisture-resistant composite coating to a substrate. A thin, adherent, highly cross-linked, substantially liquid moisture-impervious primer coating is provided on the substrate by glow discharge polymerization of a low molecular weight hydrocarbon monomer in a low pressure chamber containing the substrate, the monomer being selected from among methane, ethane, propane, ethylene, and propylene. A second polymeric coating layer is provided over the primer coating by glow discharge polymerization of a second precursor comprising a hydrocarbon or substituted hydrocarbon. The precursor exhibits a hydrogen yield of not greater than about 0.75 hydrogen atoms per molecule under the glow discharge polymerization conditions under which the second layer is deposited, whereby the second polymeric coating layer is substantially resilient and strongly bonded to the primer coating and the second layer comprises a high concentration of surface and bulk free radicals.Other References
| |