U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Emissivity correction apparatus and method

Patent 4919542 Issued on April 24, 1990. Estimated Expiration Date: Icon_subject April 27, 2008. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3433052

3439985

3539807

3611806

3796099

Method and apparatus for the enhanced detection of a component of a material
Patent #: 4564761
Issued on: 01/14/1986
Inventor: Buckwald ,   et al.

Pyrometer #2
Patent #: 4647774
Issued on: 03/03/1987
Inventor: Brisk ,   et al.

Apparatus for remote measurement of temperatures Patent #: 4708493
Issued on: 11/24/1987
Inventor: Stein

Inventors

Application

No. 186558 filed on 04/27/1988

US Classes:

374/9, EMISSIVITY DETERMINATION250/338.3, Pyroelectric type250/339.03, Including temperature control means356/43, OPTICAL PYROMETERS359/212, Including reflective type moving element359/235, Continuously rotating apertured element374/126, Having emissivity compensating or specified radiating surface374/128, Having significant signal handling circuitry (e.g., linearizing, emissivity compensation)374/133Ambient temperature compensated (e.g., dummy sensor)

Examiners

Primary: Cuchlinski, William A. Jr.
Assistant: Gutierrez, Diego

Attorney, Agent or Firm

Foreign Patent References

  • 57-160029 JP 10/13/1982
  • 58-131523 JP 08/13/1983
  • 58-171643 JP 10/13/1983
  • 60-44838 JP 03/13/1985
  • 60-131430 JP 07/13/1985
  • 61-130834 JP 06/13/1986
  • 62-50627 JP 03/13/1987
  • 744914 GB 02/13/2012

International Classes

G01J 005/10
G01N 025/00

Abstract

Radiation detectors and method measure the emissivity of a remote, heated semiconductor wafer in the presence of ambient radiation. Incident radiation within a selected waveband from a controlled source intermittently radiates the remote wafer, and reflected radiation therefrom is detected in synchronism with the intermittent incident radiation to yield output indications of emissivity of the wafer under varying processing conditions. The temperature of the wafer is monitored by another radiation detector (or detectors) operating substantially within the same selected waveband, and the temperature indications thus derived are corrected in response to the output indications of emissivity to provide indications of the true temperature of the wafer.

Other References

  • Gardner, J. L. and Jones, T. P., "Multi-Wavelength Radiation Pyrometry Where Reflectance is Measured to Estimate Emissivity", J. Phys. E. Sci. Instrum., vol. 13, No. 3, pp. 306-310, Mar. 1980
  • Johansson, Rutger, "A New Real-Time Infrared Imaging and Measuring System for Burden Top Temperature Monitoring on Blast Furnaces", ISA Transactions, vol. 17, No. 4, pp. 47-53, (1978)
  • "Industrial Use of Radiation Pyrometers under Non-Blackbody Conditions", Harrison, Thomas R., Journal of the Optical Society of America, vol. 35, No. 11, pp. 708-723, Nov. 194
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