Microwave plasma production apparatus

Patent 4908492 Issued on March 13, 1990. Estimated Expiration Date:

May 5, 2009. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

Method and apparatus for dissipating high frequency energy inside a material to be treated
Patent #: 3980855
Issued on: 09/14/1976
Inventor: Boudouris , et al.

High-frequency plasma-heating apparatus
Patent #: 4110595
Issued on: 08/29/1978
Inventor: Brambilla , et al.

Apparatus for subjecting a material to electromagnetic waves
Patent #: 4221948
Issued on: 09/09/1980
Inventor: Jean

Surface processing apparatus utilizing microwave plasma
Patent #: 4339326
Issued on: 07/13/1982
Inventor: Hirose , et al.

Plasma generator
Patent #: 4473736
Issued on: 09/25/1984
Inventor: Bloyet , et al.

Microwave plasma source having improved switching operation from plasma ignition phase to normal ion extraction phase Patent #: 4543465
Issued on: 09/24/1985
Inventor: Sakudo , et al.

Inventors

Assignee

Hitachi, Ltd.

Application

No. 347573 filed on 05/05/1989

US Classes:

219/121.52, Electrode structure118/723MR, With magnet (e.g., electron cyclotron resonance, etc.)219/121.36, Using plasma219/121.47, Spray coating219/121.48, Plasma torch structure219/690, Waveguide applicator315/111.21Plasma generating

Examiners

Primary: Paschall, Mark H.

Attorney, Agent or Firm

Antonelli, Terry & Wands

Foreign Patent References

2837594 DE 03/12/1979
2028988 GB 03/12/1980

International Class

B23K 009/00

Foreign Application Priority Data

1988-05-11 JP

Abstract

A microwave plasma production apparatus according to the present invention is so configured that a cylindrical coaxial wave guide is formed by a cylindrical outer conductor and a helical coil shaped inner conductor, and at least a part of a nonconductive discharge tube is disposed inside said inner conductor, microwave being applied between said outer conductor and said inner conductor.