Remote plasma generation process using a two-stage showerhead
Patent 4904621 Issued on February 27, 1990. Estimated Expiration Date: July 16, 2007. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
134/1.2, Semiconductor cleaning118/50.1, With means to apply electrical and/or radiant energy to work and/or coating material118/620, WITH MEANS TO APPLY ELECTRICAL AND/OR RADIANT ENERGY TO WORK AND/OR COATING MATERIAL118/728, Work support257/E21.256, By dry-etching (EPO)427/562, Electric discharge (e.g., corona, glow discharge, etc.)438/719, Silicon438/731Using intervening shield structure
A processing apparatus and method for performing a descum process (i.e. a process for removal of polymers and other organic residues) which uses a remote plasma, supplied through a distributor which includes a two-stage showerhead, to achieve improved results.
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July 16, 2007. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
