Low emissivity film for high temperature processing
April 1, 2008. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesSputter coating of glass with an oxide of a metal having an atomic number between 48 and 51 and mixtures thereof Sputtering technique for the deposition of indium oxide Sputtering process and apparatus Low resistance indium oxide coatings Heat-reflecting panel having neutral-color outer appearance Transparent conductive films and methods of producing same Selectively light-transmitting laminated structure Multiple-layer heat barrier Low emissivity coatings on transparent substrates Method of coating a transparent substrate InventorAssigneeApplicationNo. 176511 filed on 04/01/1988US Classes:428/623, Adjacent to each other428/432, Next to metal or compound thereof428/469, Next to metal salt or oxide428/632, Oxide-containing component428/660, Refractory (Group IVB, VB, or VIB) metal-base component428/673Ag-base componentExaminersPrimary: Nguyen, NamAttorney, Agent or FirmInternational ClassB21D 039/00AbstractA multiple-layer, high transmittance, low emissivity coated article which can be subjected to high temperature processing such as bending, annealing, tempering, laminating or glass welding as a result of primer layers comprising metal and metal oxide is disclosed. | |
