ApplicationNo. 091188 filed on 08/31/1987
US Classes:464/79, Element includes diverging wall portions defining annular groove completely surrounding rotational axis (e.g., bellows)29/25.01, BARRIER LAYER OR SEMICONDUCTOR DEVICE MAKING464/38, Axially biased464/157, Torque transmitted via intermeshing teeth on drive and driven members901/25, Gearing901/28Joint
ExaminersPrimary: Hall, Carl E.
Attorney, Agent or Firm
International ClassF16D 003/52
AbstractIn semiconductor vacuum processing, it is desirable to minimize the material handling mechanisms that must be located in the evacuated process chamber. To accomplish this, a mechanism has been designed that locates the necessary power elements such as motors (12-16) outside the chamber (32). Power is transmitted to the mechanism via commercially available rotary vacuum feed-through devices (30) mounted in the chamber walls (28) and the separable, zero backlash couplings (44) located within the chamber. These couplings (44) allow easy removal and replacement of the handling mechanism without the need for physical access and tools.
Field of SearchElement includes diverging wall portions defining annular groove completely surrounding rotational axis (e.g., bellows)
SEPARATE COUPLING DEVICE MOVABLE RADIALLY OF AXES OF TORQUE TRANSMITTING MEMBERS TO ACCOMMODATE PARALLEL, MISALIGNED AXES (E.G., OLDHAM COUPLING)
COUPLING ACCOMMODATES DRIVE BETWEEN MEMBERS HAVING MISALIGNED OR ANGULARLY RELATED AXES
By spring coiled about axis of rotation
Torque transmitted via intermeshing teeth on drive and driven members
Assembling or joining
For interfitted side faces
Having sealing or radiation shielding means