U.S. patents available from 1976 to present.
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Confocal measuring microscope with automatic focusing

Patent 4844617 Issued on July 4, 1989. Estimated Expiration Date: Icon_subject January 20, 2008. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3912922

Measuring microscope arrangement for measuring thickness and line width of an object
Patent #: 4674883
Issued on: 06/23/1987
Inventor: Baurschmidt

Film thickness measuring device and method Patent #: 4676647
Issued on: 06/30/1987
Inventor: Kikkawa ,   et al.

Inventors

Assignee

Application

No. 07/146046 filed on 01/20/1988

US Classes:

356/624, Focus250/201.3, Of a microscope250/372, Ultraviolet light responsive means356/328, Having diffraction grating means356/609, By focus detection356/625DIMENSION

Examiners

Primary: Evans, F. L.

Attorney, Agent or Firm

International Classes

G01B 9/04 (20060101)
G02B 21/00 (20060101)
G01J 3/00 (20060101)
G01J 3/02 (20060101)
G01J 3/28 (20060101)
G01J 3/18 (20060101)
G01J 3/12 (20060101)

Abstract

A confocal measuring microscope including a spectrometer and autofocus system sharing common optical elements in which the intensity of light entering the spectrometer from a particular spot on a workpiece is used to determine a focus condition for the same spot. The microscope includes at least one light source, an illumination field stop, and a microscope objective that images the stop onto a workpiece supported by a movable platform. The objective also forms an image of the illuminated portion of the object. An aperture in a second stop and intersecting the image plane passes light from part of the image to the spectrometer, while viewing optics are used to view the image. In one embodiment, a detector is placed at the zero order position, while in another embodiment a laser is placed at the zero order position. In the later embodiment an integrator circuit connected to the detector array replaces the zero order detector for measuring the total intensity of light entering the spectrometer. A best focus condition occurs when the total intensity is a maximum for a positive confocal configuration, i.e. where source and detector are on opposite sides of their respective field stops from said workpiece, and a minimum for a negative confocal configuration, i.e. where the source and workpiece are on the same side of a reflective illumination field stop with aperture. The movable platform may be scanned axially to achieve and maintain object focus as the object is scanned transversely.

Other References

  • D K. Hamilton et al., "Surface Profile Measurement Using the Confocal Microscope", Journal of Applied Physics, 53(7), Jul., 1982, pp. 5320-5322
  • T. Wilson et al., Theory and Practice of Scanning Optical Microscopy, Academic Press, (London), 1984, see especially pages 123-139
  • G. Hausler et al., "Simple Focusing Criterion", Applied Optics, vol. 23, No. 15, Aug. 1, 1984, pp. 2468-2469
  • J. M. Lerner et al., "Aberration Corrected Holographically Recorded Diffraction Gratings", SPIE vol. 240--Periodic Structures, Gratings, Moire Patterns and Diffraction Phenomena, 1980, pp. 72-81
  • T. R. Corle et al., "Distance Measurements by Differential Confocal Optical Ranging", Applied Optics, vol. 26, No. 12, Jun. 15, 1987, pp. 2416-2420
  • L. Reimer et al., "Lock-In Technique for Depth-Profiling and Magnetooptical Kerr Effect Imaging in Scanning Optical Microscopy", Scanning, vol. 9, No. 1, 1987, pp. 17-25
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