Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water
Spin coating process
Apparatus for in-situ processing of photoplates
Disc cleaning machine
VLSI chemical reactor
Method and apparatus for developing resist film including a movable nozzle arm Patent #: 4564280
ApplicationNo. 07/186783 filed on 04/25/1988
US Classes:134/153, Rotary, pivoted or swinging work holder134/157, Rotary, revolving, swinging or oscillating motion work holder or carrier134/198, With spray or jet supplying and/or applying means134/902SEMICONDUCTOR WAFER
ExaminersPrimary: Coe, Philip R.
Assistant: Stinson, Frankie L.
Attorney, Agent or Firm
International ClassesG03F 7/16 (20060101)
G03F 7/30 (20060101)
AbstractApparatus and method for cleaning material at the outer edge of an object by applying a solvent for the material to a flat surface adjacent the edge and moving the solvent onto the edge by centrifugal force.
Field of SearchMotor operated apparatus
With movable work support and separate movable means to cause fluid motion (e.g., pump, splasher, agitator)
Axially rotary chuck, mandrel, rod or axle type holder
Rotary, pivoted or swinging work holder
Rotary, revolving, swinging or oscillating motion work holder or carrier