Patent References 3641973 3656454 3874525 3915117 Vapor deposition apparatus Device for cryogenically fabricating source material for plasma X-ray lasers Wafer holding apparatus for ion implantation Vacuum load lock apparatus Patent #: 4632624 InventorApplicationNo. 06/874000 filed on 06/13/1986US Classes:414/217, APPARATUS FOR MOVING MATERIAL BETWEEN ZONES HAVING DIFFERENT PRESSURES AND INHIBITING CHANGE IN PRESSURE GRADIENT THEREBETWEEN414/939Including wafer charging or discharging means for vacuum chamberExaminersPrimary: Aschenbrenner, Peter A.Assistant: Brittain, James R. Attorney, Agent or FirmInternational ClassH01L 21/00 (20060101)Foreign Application Priority Data1985-06-17 JPAbstractA main chamber is provided through which a workpiece is loaded or unloaded. A second chamber is provided within the main chamber to cover the workpiece during evacuation and gas introduction processes performed within the main chamber. The second chamber protects the workpiece from floating dust deposited on parts within the main chamber and blown about by a turbulent flow of introduced or evacuated gas therein. The second chamber can be shaped like a bell jar and is made as small as possible. A driving circuit lifts the bell jar up and down. The gas pressure within the second chamber is maintained greater than or equal to that of the main chamber by a pressure control circuit to prevent dust intrusion into the second chamber. A slow leak circuit is provided as a pressure control device by forming a loose vacuum-seal between the second chamber and the main chamber. A gas introduction circuit and/or evacuation circuit may be connected to the second chamber. A workpiece transfer device is located at the outside of the second chamber. The second chamber may be part of a vacuum processing chamber, thereby allowing the workpiece to be directly loaded into and unloaded from the processing chamber. | |