U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Far ultraviolet surgical and dental procedures

Patent 4784135 Issued on November 15, 1988. Estimated Expiration Date: Icon_subject August 11, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

2249610

3769963

3769983

3821510

Method for the manufacturing of a disposable operation textile
Patent #: 3956048
Issued on: 05/11/1976
Inventor: Nordgren

Ozone absorbance controller
Patent #: 4049987
Issued on: 09/20/1977
Inventor: Helms

Ultraviolet endoscope
Patent #: 4273110
Issued on: 06/16/1981
Inventor: Groux

Device for preventing tooth decay by laser beam irradiation and method of preventing tooth decay by use of the same
Patent #: 4273535
Issued on: 06/16/1981
Inventor: Yamamoto ,   et al.

Control for laser hemangioma treatment system
Patent #: 4316467
Issued on: 02/23/1982
Inventor: Muckerheide

Method for laser depilation Patent #: 4388924
Issued on: 06/21/1983
Inventor: Weissman ,   et al.

Inventors

Application

No. 06/894520 filed on 08/11/1986

US Classes:

606/3, With particular wavelength606/40Coagulation

Examiners

Primary: Hindenburg, Max

Attorney, Agent or Firm

International Classes

A61B 18/20 (20060101)
A61B 18/26 (20060101)
A61C 1/00 (20060101)
A61F 9/008 (20060101)
A61F 9/007 (20060101)
A61B 17/00 (20060101)

Abstract

A method and apparatus are described for photoetching organic biological matter without requiring heat as the dominant etching mechanism. Far-ultraviolet radiation of wavelengths less than 200 nm are used to selectively remove organic biological material, where the radiation has an energy fluence sufficiently great to cause ablative photodecomposition. Either continuous wave or pulse radiation can be used, a suitable ultraviolet light source being an ArF excimer laser having an output at 193 nm. The exposed biological material is ablatively photodecomposed without heating or damage to the rest of the organic material. Medical and dental applications include the removal of damaged or unhealthy tissue from bone, removal of skin lesions, cutting or sectioning healthy tissue, and the treatment of decayed teeth.

Other References

  • J Taboada et al., Health Physics, 40, pp. 677-683, 1981, "Response of the Corneal Epithelium to KrF Excimer Laser Pulses"
  • J. Taboada et al., "An Extreme Sensitivity in the Corneal Epithelium . . . , "Aerospace Medical Assoc. 1981, Meeting, San Antonio, TX
  • "Ablative Photodecomposition: Action of Far-Ultraviolet (193 nm) Laser Radiation on Poly(Ethylene Teraphthilade) Films", Srinivasan and Leigh Dec. 1, 1982 J. Am. Chem. Soc. 1982, 104, 6784-6785
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