Patent References 2249610 3769963 3769983 3821510 Method for the manufacturing of a disposable operation textile Ozone absorbance controller Ultraviolet endoscope Device for preventing tooth decay by laser beam irradiation and method of preventing tooth decay by use of the same Control for laser hemangioma treatment system Method for laser depilation Patent #: 4388924 InventorsApplicationNo. 06/894520 filed on 08/11/1986US Classes:606/3, With particular wavelength606/40CoagulationExaminersPrimary: Hindenburg, MaxAttorney, Agent or FirmInternational ClassesA61B 18/20 (20060101)A61B 18/26 (20060101) A61C 1/00 (20060101) A61F 9/008 (20060101) A61F 9/007 (20060101) A61B 17/00 (20060101) AbstractA method and apparatus are described for photoetching organic biological matter without requiring heat as the dominant etching mechanism. Far-ultraviolet radiation of wavelengths less than 200 nm are used to selectively remove organic biological material, where the radiation has an energy fluence sufficiently great to cause ablative photodecomposition. Either continuous wave or pulse radiation can be used, a suitable ultraviolet light source being an ArF excimer laser having an output at 193 nm. The exposed biological material is ablatively photodecomposed without heating or damage to the rest of the organic material. Medical and dental applications include the removal of damaged or unhealthy tissue from bone, removal of skin lesions, cutting or sectioning healthy tissue, and the treatment of decayed teeth.Other References
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