U.S. patents available from 1976 to present.
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Electrically alterable non-volatile memory device

Patent 4780750 Issued on October 25, 1988. Estimated Expiration Date: Icon_subject January 3, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Electrically programmable and erasable memory cell
Patent #: 4477825
Issued on: 10/16/1984
Inventor: Yaron ,   et al.

Electrically erasable programmable read only memory
Patent #: 4477883
Issued on: 10/16/1984
Inventor: Wada

Electrically alterable, nonvolatile floating gate memory device
Patent #: 4513397
Issued on: 04/23/1985
Inventor: Ipri ,   et al.

Non-volatile static random-access memory cell
Patent #: 4527255
Issued on: 07/02/1985
Inventor: Keshtbod

Semiconductor device having insulated gate type non-volatile semiconductor memory elements
Patent #: 4527259
Issued on: 07/02/1985
Inventor: Watanabe

Nonvolatile latch
Patent #: 4571704
Issued on: 02/18/1986
Inventor: Bohac, Jr.

Nonvolatile semiconductor memory device with electrically selectable, erasable and programmable function
Patent #: 4571705
Issued on: 02/18/1986
Inventor: Wada

Non-volatile dynamic RAM cell
Patent #: 4611309
Issued on: 09/09/1986
Inventor: Chuang ,   et al.

Improved nonvolatile memory circuit using a dual node floating gate memory cell Patent #: 4685083
Issued on: 08/04/1987
Inventor: Leuschner

Inventors

Assignee

Application

No. 06/815869 filed on 01/03/1986

US Classes:

365/185.28, Tunnel programming257/318, Additional control electrode is doped region in semiconductor substrate257/319, Plural additional contacted control electrodes257/321, With thin insulator region for charging or discharging floating electrode by quantum mechanical tunneling257/E29.304, Charging by tunneling of carriers (e.g., Fowler-Nordheim tunneling) (EPO)365/185.09, Error correction (e.g., redundancy, endurance)365/185.1, Extended floating gate365/185.21Sensing circuitry (e.g., current mirror)

Examiners

Primary: Clawson, Joseph E. Jr.

Attorney, Agent or Firm

International Classes

H01L 29/66 (20060101)
H01L 29/788 (20060101)

Abstract

In this invention, an Electrically Alterable Non-Volatile Memory (EANOM) cell is disclosed. The EANOM ceil comprises an MOS transistor, having a source, a gate and a drain. The EANOM cell also has a two-terminal tunnel device, one end of which is connected to the gate of the MOS transistor. The other terminal being labelled "T". The tunnel device causes charges to be stored or removed from the gate of the MOS transistor. In a preferred embodiment, a four-terminal EANOM cell is disclosed. The four terminals of the EANOM cell are terminals T, S (source of the MOS transistor), D (drain of the MOS transistor) and a terminal C which is capacitively coupled to the gate of the MOS transistor. The EANOM cell can be used in a memory circuit to increase the reliability thereof. Two or more EANOM cells are connected in tandem and operate simultaneously. Catastrophic failure of one EANOM cell results in an open circuit with the other EANOM cell continuing to function.

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