U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Silicon nitride protective coatings for silvered glass mirrors

Patent 4780372 Issued on October 25, 1988. Estimated Expiration Date: Icon_subject June 4, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Combination glass/low temperature deposited Siw Nx Hy O.sub. z
Patent #: 4097889
Issued on: 06/27/1978
Inventor: Kern ,   et al.

Bulk glass having improved properties
Patent #: 4273828
Issued on: 06/16/1981
Inventor: Tracy ,   et al.

Protective coating means for articles such as gold-plated jewelry and wristwatch components Patent #: 4517217
Issued on: 05/14/1985
Inventor: Hoffman

Inventors

Assignee

Application

No. 06/873069 filed on 06/04/1986

US Classes:

428/428, Next to another silicon containing layer359/883, Laminated or layered mirror support359/884, With selective absorption or transparent overcoating427/397.7, Inorganic silicon-containing coating427/419.7, Boride, carbide, nitride, phosphide, silicide, or sulfide-containing coating428/433, Alloy or free metal428/434, Noble metal containing428/448, As intermediate layer428/450, Next to metal428/469, Next to metal salt or oxide428/472, Refractory metal salt or oxide428/472.1, Formed in situ428/698, Carbide-, nitride-, or sulfide-containing layer428/912.2MIRROR

Examiners

Primary: Kittle, John E.
Assistant: Schwartz, P. R.

Attorney, Agent or Firm

International Classes

C03C 17/36 (20060101)
G02B 1/10 (20060101)
G02B 5/08 (20060101)

Abstract

A protective diffusion barrier for metalized mirror structures is provided by a layer or coating of silicon nitride which is a very dense, transparent, dielectric material that is impervious to water, alkali, and other impurities and corrosive substances that typically attack the metal layers of mirrors and cause degradation of the mirrors' reflectivity. The silicon nitride layer can be deposited on the substrate before metal deposition to stabilize the metal/substrate interface, and it can be deposited over the metal to encapsulate it and protect the metal from corrosion or other degradation. Mirrors coated with silicon nitride according to this invention can also be used as front surface mirrors.

Other References

  • Kern & Rosler, Advances in Deposition Process for Passivation Films, J. of Vac. Sci & Techno. vol. 14, No. 5, pp. 1082-1099, 1977
  • Milek, Silicon Nitride for Microelectronic Applications, Handbook of Electronic Materials, vol. 3, IFI/Plenum, NY, NY, pp. 10-13 (1971); SERI/TR-31-042
  • SERI Materials Branch Semiannual Report, Jan. 1, 1978-Jun. 30, 1978, Solar Energy Research Institute, Golden, Colorado, (1978)
  • SERI/RR-31-145, Solar Glass Mirror Program A Planning Report on Near-Term Mirror Development Activities, Solar Energy Research Institute, Golden, Colorado (1979), Vossen and Kern, Thin Film Processes, Academic Press NY, NY (1978)
PatentsPlus Images
Enhanced PDF formats
loading...
PatentsPlus: add to cart
PatentsPlus: add to cartSearch-enhanced full patent PDF image
$9.95more info
PatentsPlus: add to cart
PatentsPlus: add to cartIntelligent turbocharged patent PDFs with marked up images
$18.95more info
 
Sign InRegister
Username  
Password   
forgot password?