System for providing photomask alignment keys in semiconductor integrated circuit processing
Method of manufacturing a semiconductor device
Process for preparing a color proofing sheet
Sequential automatic registration and imagewise exposure of a sheet substrate
Process and composition for producing permanently water wettable surfaces
Photoresist lift-off process for fabricating semiconductor devices Patent #: 4564584
ApplicationNo. 06/924737 filed on 10/30/1986
US Classes:430/293, Color proofing or multicolor image formation430/22, REGISTRATION OR LAYOUT PROCESS OTHER THAN COLOR PROOFING430/7Color
ExaminersPrimary: Brammer, Jack P.
Attorney, Agent or Firm
International ClassesG03F 7/00 (20060101)
G03F 9/00 (20060101)
Foreign Application Priority Data1985-11-06 JP
AbstractA process for producing a color filter having plural number of colorant layer patterns by repeating, for each of a plural number of starting materials for colorant layer, the steps of subjecting a substrate having a photoresist laminated thereon to pattern exposure to effect patterning of said photo-resist, laminating a colorant layer from said photoresist above and removing the layer of said photoresist having said colorant layer laminated thereon by dissolution to form a colorant layer pattern, comprises forming an alignment mark on said substrate with the same starting material as a first colorant layer pattern simultaneously with formation of said first colorant layer pattern and performing registration of the mask during formation of a second colorant layer pattern et seq. through said alignment mark.