Process for producing color filter using alignment marks
October 30, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesSystem for providing photomask alignment keys in semiconductor integrated circuit processing Method of manufacturing a semiconductor device Process for preparing a color proofing sheet Sequential automatic registration and imagewise exposure of a sheet substrate Process and composition for producing permanently water wettable surfaces Photoresist lift-off process for fabricating semiconductor devices Patent #: 4564584 InventorsAssigneeApplicationNo. 06/924737 filed on 10/30/1986US Classes:430/293, Color proofing or multicolor image formation430/22, REGISTRATION OR LAYOUT PROCESS OTHER THAN COLOR PROOFING430/7ColorExaminersPrimary: Brammer, Jack P.Attorney, Agent or FirmInternational ClassesG03F 7/00 (20060101)G03F 9/00 (20060101) Foreign Application Priority Data1985-11-06 JPAbstractA process for producing a color filter having plural number of colorant layer patterns by repeating, for each of a plural number of starting materials for colorant layer, the steps of subjecting a substrate having a photoresist laminated thereon to pattern exposure to effect patterning of said photo-resist, laminating a colorant layer from said photoresist above and removing the layer of said photoresist having said colorant layer laminated thereon by dissolution to form a colorant layer pattern, comprises forming an alignment mark on said substrate with the same starting material as a first colorant layer pattern simultaneously with formation of said first colorant layer pattern and performing registration of the mask during formation of a second colorant layer pattern et seq. through said alignment mark. |
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