U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Automatic accurate alignment system

Patent 4757550 Issued on July 12, 1988. Estimated Expiration Date: Icon_subject July 12, 2005. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3450480

3895854

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Inventor: Kono

Digital video correlator
Patent #: 4244029
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Inventor: Hogan ,   et al.

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Solid-state video camera having a video signal processor
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Electron probe microanalyzer comprising an observation system having double magnification
Patent #: 4440475
Issued on: 04/03/1984
Inventor: Colliaux

Method of aligning a mask and a wafer for manufacturing semiconductor circuit elements
Patent #: 4530604
Issued on: 07/23/1985
Inventor: Okutsu ,   et al.

Inclinable microscope body
Patent #: 4597644
Issued on: 07/01/1986
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Method and apparatus for automatic wafer inspection
Patent #: 4618938
Issued on: 10/21/1986
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Inventor

Assignee

Application

No. 06/732219 filed on 05/09/1985

US Classes:

382/148, At plural magnifications or resolutions348/95, Alignment or positioning382/151Alignment, registration, or position determination

Examiners

Primary: Boudreau, Leo H.
Assistant: Skinner, A. Anne

Attorney, Agent or Firm

International Classes

B23Q 15/20 (20060101)
G06T 7/00 (20060101)
G06K 9/46 (20060101)
B23Q 15/22 (20060101)

Foreign Application Priority Data

1984-05-21 JP

Abstract

An automatic accurate alignment system for positioning an object to be worked which has a certain pattern on its surface at a required position. The system performs primary positioning of the object to be worked on the basis of low magnification pattern matching with respect to at least a part of the image of the object magnified at a relatively low magnification. Thereafter, the system performs secondary positioning of the object to be worked on the basis of high magnification pattern matching with respect to at least a part of the image of the object magnified at a relatively high magnification.

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