Anode for magnetic sputtering of gradient films
Patent 4744880 Issued on May 17, 1988. Estimated Expiration Date: 
May 17, 2005. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
May 17, 2005. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesMethod and apparatus for forming oxide coating by reactive sputtering technique Magnetically-assisted sputtering method for producing vertical recording media Method and apparatus for forming electrically conductive transparent oxide High rate magnetron sputtering of high permeability materials Anode for magnetic sputtering apparatus Patent #: 4478702 InventorsAssigneeApplicationNo. 06/661748 filed on 10/17/1984US Classes:204/298.19, Planar magnetron204/192.12, Glow discharge sputter deposition (e.g., cathode sputtering, etc.)204/298.14Specified anode particularsExaminersPrimary: Niebling, John F.Assistant: Nguyen, Nam Attorney, Agent or FirmInternational ClassesH01J 37/34 (20060101)H01J 37/32 (20060101) AbstractAn improved anode system for producing uniform gradient coatings by magnetic sputtering is disclosed, comprising a pair of anode plates asymmetrically designed and positioned along the length of the cathode.Other References
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