Method and apparatus for improving the yield of integrated circuit devices
Patent 4739787 Issued on April 26, 1988. Estimated Expiration Date: 
November 10, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
November 10, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3429336 Concentrating vortex shaker Programmable pressure regulator for titanium superplastic forming apparatus Patent #: 4394871 InventorApplicationNo. 06/928509 filed on 11/10/1986US Classes:137/14, Involving pressure control137/487.5, Electrically actuated valve137/624.11, Programmer or timer137/624.18Plural, sequential, valve actuationsExaminersPrimary: Cohan, AlanAttorney, Agent or FirmInternational ClassG05D 16/20 (20060101)AbstractA method and apparatus for reducing the incidence of product contamination during processing of the product in a vacuum chamber. By providing soft-start valves in the vacuum and vent lines, and by properly driving said soft-start valves, it is possible to reduce the gas flow rates from and into the vacuum chamber to such a low level, that dust-like particles remaining in the chamber from prior product processing steps is not disturbed and allowed to settle upon the product then being treated. | |
