Protective overcoat of titanium nitride films
Patent 4690871 Issued on September 1, 1987. Estimated Expiration Date: 
March 10, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
March 10, 2006. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3674453 Process of forming a metal or metal compound coating on a face of a glass substrate and apparatus suitable for use in forming such coating Process for forming tin oxide glass coating Chemical vapor deposition of titanium nitride and like films Process for the production of glass panes having a glare protection filter and apparatus for carrying out the process Patent #: 4562093 InventorApplicationNo. 06/837774 filed on 03/10/1986US Classes:428/432, Next to metal or compound thereof65/60.1, With coating65/60.2, Plural diverse layers65/60.51, From inorganic metal salt65/60.53From inorganic oxides or hydroxidesExaminersPrimary: Kellogg, Arthur D.Attorney, Agent or FirmInternational ClassesC03C 17/34 (20060101)G02B 1/10 (20060101) AbstractTransparent glass sheets comprising thereon titanium-nitride as the principal solar screening layer for reducing transmission of near infrared and, thereover, a layer of tin oxide of about 300 to 800 angstroms thick. The tin oxide layer serves to protect the titanium nitride from oxidation during high-temperature processing procedures, increases the abrasion-resistance, and at roughly the midpoint of the 300 to 800 angstrom range, is useful in reducing the color and visible reflectivity properties of some titanium nitride films. In practice, some of the tin oxide, that is not required for physical protection of the TiN or visual effect, can be positioned between the nitride and the glass substrate. | |
