U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Two-dimensional imaging with line arrays

Patent 4636080 Issued on January 13, 1987. Estimated Expiration Date: Icon_subject May 7, 2004. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3813169

Zone plate alignment marks
Patent #: 4037969
Issued on: 07/26/1977
Inventor: Feldman ,   et al.

Interferometer
Patent #: 4188122
Issued on: 02/12/1980
Inventor: Massie ,   et al.

Apparatus for detecting an output image of an optical correlation
Patent #: 4207002
Issued on: 06/10/1980
Inventor: Gara ,   et al.

Method and apparatus for aligning mask and wafer members
Patent #: 4326805
Issued on: 04/27/1982
Inventor: Feldman ,   et al.

Method and apparatus for positioning a tapered body
Patent #: 4341472
Issued on: 07/27/1982
Inventor: Gorog ,   et al.

Optical fringe analysis
Patent #: 4350443
Issued on: 09/21/1982
Inventor: Williamson

Wafer tilt compensation in zone plate alignment system
Patent #: 4398824
Issued on: 08/16/1983
Inventor: Feldman ,   et al.

Positioning method Patent #: 4531060
Issued on: 07/23/1985
Inventor: Suwa ,   et al.

Inventor

Assignee

Application

No. 06/607956 filed on 05/07/1984

US Classes:

356/401With registration indicia (e.g., scale)

Examiners

Primary: Willis, Davis L.

Attorney, Agent or Firm

International Class

G03F 9/00 (20060101)

Abstract

One or two linear arrays of photodetectors are combined with optical elements to form an arrangement capable of determining the X-Y location of a focused laser beam or other light spot. The resulting arrangement is characterized by low cost and by excellent resolution, stability and linearity. Moreover, the arrangement provides output data that can be easily and quickly processed. The combination is adapted, for example, for use with zone plates in aligning masks and wafers in semiconductor fabrication.

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