U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Spinner chuck

Patent 4603867 Issued on August 5, 1986. Estimated Expiration Date: Icon_subject April 2, 2004. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

2443987

2730370

2955829

3484093

3730134

Rotary vacuum-chuck using no rotary union
Patent #: 4183545
Issued on: 01/15/1980
Inventor: Daly

Distortion free 3 point vacuum fixture
Patent #: 4357006
Issued on: 11/02/1982
Inventor: Hayes

Method of mixing elastomeric polymers for improved physical properties
Patent #: 4420585
Issued on: 12/13/1983
Inventor: Lee ,   et al.

Vacuum-type article holder and methods of supportively retaining articles Patent #: 4428815
Issued on: 01/31/1984
Inventor: Powell ,   et al.

Inventors

Assignee

Application

No. 06/596207 filed on 04/02/1984

US Classes:

279/3, VACUUM269/27, Cylinder-piston means in series with additional positioning means451/388Vacuum

Examiners

Primary: Weidenfeld, Gil
Assistant: Webb, Glenn L.

Attorney, Agent or Firm

International Classes

B23B 31/30 (20060101)
B23B 31/02 (20060101)

Abstract

A vacuum spinner chuck having improved holding power for thin wafers is obtained by providing a retention means for moveably holding an O-ring on the peripheral edge of the chuck. There is a first part-circular portion adjacent the upper surface of the chuck, arranged so that in the absence of vacuum the O-ring protrudes above the chuck surface and contacts the wafer. Below this first part-circular portion is a second sloped portion which tilts away from the surface of the spinner chuck by an angle preferably in the range 30-60 degrees. There is a smooth transition between these two portions. When vacuum is applied to the space between the wafer and the chuck, the wafer presses on the O-ring causing it to stretch and move down from the part-circular portion onto the sloped portion until the wafer rests on the surface of the chuck. The stretch creates an opposing force which holds the O-ring in contact with the wafer and the spinner chuck to prevent loss of vacuum. The stretch automatically returns the O-ring to its initial position when the vacuum is removed. The holding power of the chuck is doubled.

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