Optical exposure apparatus
Apparatus for the automatic alignment of two superimposed objects, e.g. a semiconductor wafer and mask
CCD electrode and channel structure for 180° turn
Optical device for the alignment of two superimposed objects
Method of alignment
Method of aligning a body
Television monitoring system for automatically aligning semiconductor devices during manufacture
ApplicationNo. 06/571297 filed on 01/16/1984
US Classes:382/288, Determining center of gravity or moment250/491.1, MEANS TO ALIGN OR POSITION AN OBJECT RELATIVE TO A SOURCE OR DETECTOR348/94, Position detection356/615, Position transverse to viewing axis382/151, Alignment, registration, or position determination382/291Determining the position of an object
ExaminersPrimary: Boudreau, Leo H.
Assistant: Mancuso, Joseph
Attorney, Agent or Firm
International ClassesG06T 7/60 (20060101)
G06K 9/32 (20060101)
AbstractA computerized method and point location system apparatus is disclosed for ascertaining the center of a primitive or fundamental object whose shape and approximate location are known. The technique involves obtaining an image of the object, selecting a trial center, and generating a locus of points having a predetermined relationship with the center. Such a locus of points could include a circle. The number of points overlying the object in each quadrant is obtained and the counts of these points per quadrant are compared. From this comparison, error signals are provided to adjust the relative location of the trial center. This is repeated until the trial center overlies the geometric center within the predefined accuracy limits.