Patent References 3296011 3362848 3379803 3547683 Method for continuous deposition by vacuum evaporation Patent #: 4325986 InventorsApplicationNo. 06/532817 filed on 09/16/1983US Classes:427/250, Metal coating427/255.5, Moving the base427/255.6, Organic coating applied by vapor, gas, or smoke427/255.7, Plural coatings applied by vapor, gas, or smoke427/497, Vapor deposition utilized427/509, Vapor deposition utilized427/526Nonuniform or patterned ion plating or ion implanting (e.g., mask, etc.)ExaminersPrimary: Childs, Sadie L.Attorney, Agent or FirmInternational ClassesB05D 7/24 (20060101)C23C 14/24 (20060101) C23C 14/56 (20060101) C23C 14/12 (20060101) G11B 5/84 (20060101) G11B 5/72 (20060101) G11B 5/851 (20060101) B05D 1/28 (20060101) Foreign Application Priority Data1981-02-16 JPAbstractA process for forming a vapor-deposited thin layer of organic material is disclosed. The process involves placing organic material on a support base within a vacuum chamber and providing a heat source in the vicinity of the organic material. A second support base is then provided within the vacuum chamber and heat is applied to the organic material at a temperature which causes the organic material to form vapors. The vapors are vapor-deposited on the second support base forming the thin layer of organic material. It is generally desirable to move both of the support bases during the vapor deposition process allowing the formation of a continuous uniform thin layer of organic material. | |