Method of making liquid jet recording head

Patent 4536250 Issued on August 20, 1985. Estimated Expiration Date:

April 13, 2004. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Abstract Claims Description Full Text

Patent References

Charge electrode array and combination for ink jet printing and method of manufacture
Patent #: 4047184
Issued on: 09/06/1977
Inventor: Bassous , et al.

Method of making an electron beam window Patent #: 4468282
Issued on: 08/28/1984
Inventor: Neukermans

Inventors

Assignee

Canon Kabushiki Kaisha

Application

No. 06/600150 filed on 04/13/1984

US Classes:

216/27, FORMING OR TREATING THERMAL INK JET ARTICLE (E.G., PRINT HEAD, LIQUID JET RECORDING HEAD, ETC.)216/48, Mask is exposed to nonimaging radiation216/76, Etching of substrate containing at least one compound having at least one oxygen atom and at least one metal atom216/79, Etching silicon containing substrate216/80, Silicon containing substrate is glass216/97, Substrate is glass216/99, Substrate contains silicon or silicon compound347/56With thermal force ejection

Examiners

Primary: Powell, William A.

Attorney, Agent or Firm

Fitzpatrick, Cella, Harper & Scinto

International Classes

B41J 2/16 (20060101)
H05B 3/10 (20060101)
H05K 3/06 (20060101)

Foreign Application Priority Data

1983-04-20 JP

Abstract

A method of making a liquid jet recording head having a liquid discharge section including orifice means for discharging the liquid to form flying droplets thereof and liquid passage means communicating with said orifice means and having a thermally acting portion for causing a thermal energy to act on the liquid to form the liquid droplets, and electro-thermal converting means including a heat generating resistive layer on a substrate, at least one pair of opposed electrodes electrically connected with said heat generating resistive layer and a heat generating part between said electrodes, which method comprises the steps of forming the electrodes and heat generating portion through at least first and second etching processes, a photoresist pattern formed by the first etching process having a width smaller than those of photoresist patterns formed by the second and successive etching processes.