Charge electrode array and combination for ink jet printing and method of manufacture
Method of making an electron beam window Patent #: 4468282
ApplicationNo. 06/600150 filed on 04/13/1984
US Classes:216/27, FORMING OR TREATING THERMAL INK JET ARTICLE (E.G., PRINT HEAD, LIQUID JET RECORDING HEAD, ETC.)216/48, Mask is exposed to nonimaging radiation216/76, Etching of substrate containing at least one compound having at least one oxygen atom and at least one metal atom216/79, Etching silicon containing substrate216/80, Silicon containing substrate is glass216/97, Substrate is glass216/99, Substrate contains silicon or silicon compound347/56With thermal force ejection
ExaminersPrimary: Powell, William A.
Attorney, Agent or Firm
International ClassesB41J 2/16 (20060101)
H05B 3/10 (20060101)
H05K 3/06 (20060101)
Foreign Application Priority Data1983-04-20 JP
AbstractA method of making a liquid jet recording head having a liquid discharge section including orifice means for discharging the liquid to form flying droplets thereof and liquid passage means communicating with said orifice means and having a thermally acting portion for causing a thermal energy to act on the liquid to form the liquid droplets, and electro-thermal converting means including a heat generating resistive layer on a substrate, at least one pair of opposed electrodes electrically connected with said heat generating resistive layer and a heat generating part between said electrodes, which method comprises the steps of forming the electrodes and heat generating portion through at least first and second etching processes, a photoresist pattern formed by the first etching process having a width smaller than those of photoresist patterns formed by the second and successive etching processes.