U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Lapping machine

Patent 4502252 Issued on March 5, 1985. Estimated Expiration Date: Icon_subject March 28, 2003. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

1465117

3443342

3568371

3668813

3691694

3889428

Methods and apparatus for treating wafer-like articles Patent #: 3970471
Issued on: 07/20/1976
Inventor: Bankes ,   et al.

Inventor

Assignee

Application

No. 06/479471 filed on 03/28/1983

US Classes:

451/269, Rotary work holder451/290, Disk or wheel abrader451/339Ejector or unloader

Examiners

Primary: Smith, James G.
Assistant: Meislin, D. S.

Attorney, Agent or Firm

International Class

B24B 37/04 (20060101)

Foreign Application Priority Data

1982-03-29 JP

Abstract

In a lapping apparatus, washing water is ejected from washing water holes toward a carrier holding wafers after the wafers are polished. Thus, the wafers are separated from the carrier and upper and lower polishing members. Then, the carrier is forced up above the upper polishing member by a pushing ring. The wafers left on the upper member are carried onto a table by a first sweeper of an automatic collecting device. The transferred wafers are arranged in a line along a second sweeper. Then, the second sweeper pushes and moves the wafers in the direction of their arrangement toward a cassette on one side of the table. The wafers are housed in holder portions in the cassette, and are then immersed, along with the cassette, in a pure water tank.

Other References

  • E Mendel et al., "Multiple-Water Free Polishing Part I, Machine Concepts", 1979, ECS
  • E. Mendel et al., "Multiple Wafer Free Polishing Part II Process", 1979, ECS
  • E. Mendel et al., "Pad Materials for Chemical Mechanical Polishing", 1979
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