U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Mitomycin analogs

Patent 4460599 Issued on July 17, 1984. Estimated Expiration Date: Icon_subject July 17, 2001. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

3332944

3410867

3429894

3450705

3514452

Mitomycin C derivatives
Patent #: 4231936
Issued on: 11/04/1980
Inventor: Nakano ,   et al.

Mitomycin analogs Patent #: 4268676
Issued on: 05/19/1981
Inventor: Remers

Inventor

Assignee

Application

No. 06/206529 filed on 11/13/1980

US Classes:

514/370, Nitrogen bonded directly to ring carbon of the thiazole ring514/413Ring nitrogen is shared by the cyclos of the bicyclo ring system

Examiners

Primary: Daus, Donald G.
Assistant: Teoli, William A. Jr.

Attorney, Agent or Firm

International Classes

C07D 487/14 (20060101)
C07D 487/00 (20060101)

Abstract

Compounds of the formula, I, ##STR1## wherein: Y is hydrogen or lower alkyl; and X is a thiazolamino radical, a furfurylamino radical or a radical of the formula, ##STR2## in which R, R1, and R2 are the same or different and selected from the group consisting of hydrogen and lower alkyl, and R3 is selected from the group consisting of lower alkenyl, halo-lower alkenyl, lower alkynyl, lower akloxycarbonyl, thienyl, formamyl, tetrahydrofuryl and benzene sulfonamide.Also disclosed are novel methods for treatment of neoplastic disease states in animals, which methods comprise administering a therapeutically effective amount of a compound of the formula, Ia, ##STR3## wherein: Y is hydrogen or lower alkyl; and Z is a thiazolamino radical, a furfurylamino radical, a cyclopropylamino radical, a pyridylamino radical, or a radical of the formula, ##STR4## in which R4, R5, and R6 are the same or different and selected from the group consisting of hydrogen and lower alkyl, and R7 is selected from the group consisting of lower alkenyl, halo-lower alkenyl, lower alkynyl, lower alkoxycarbonyl, halo-lower alkyl, hydroxy-lower alkyl, pyridyl, thienyl, formamyl, tetrahydrofuryl, benzyl, and benzene sulfonamide.

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