Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water Patent #: 4027686
ApplicationNo. 06/404798 filed on 08/03/1982
US Classes:134/33, Centrifugal force and/or rotated work body134/154, With non-impelling fluid deflector or baffle134/183, Movably mounted, adjustable or removable134/902SEMICONDUCTOR WAFER
ExaminersPrimary: Bashore, S. Leon
Assistant: Woodard, Joye L.
Attorney, Agent or Firm
International ClassG03F 7/30 (20060101)
AbstractApparatus and method for cleaning material at the outer edge of an object by applying a fluid, which can be a solvent, for the material to a flat surface adjacent the edge by contact and moving the solvent onto the edge by centrifugal force. A slot is provided in a planar surface. The slot is filled with solvent for contact with the flat surface of the object.
Field of SearchCentrifugal force and/or rotated work body
With treating fluid motion
Including steam, gaseous agent or temperature feature
And spray or jet applying conduit or nozzle
Rotary, pivoted or swinging work holder
With non-impelling fluid deflector or baffle
Rotary, revolving, swinging or oscillating motion work holder or carrier
Movably mounted, adjustable or removable