Method and apparatus for forming electrically conductive transparent oxide
Patent 4428809 Issued on January 31, 1984. Estimated Expiration Date: 
March 26, 2002. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
March 26, 2002. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent References 3884787 Sputtering technique for the deposition of indium oxide Patent #: 4113599 InventorsApplicationNo. 06/362432 filed on 03/26/1982US Classes:204/192.29, Transparent conductor204/298.11Specified mask, shield or shutterExaminersPrimary: Demers, Arthur P.Attorney, Agent or FirmInternational ClassesC23C 14/35 (20060101)C23C 14/00 (20060101) Foreign Application Priority Data1981-03-27 DEAbstractThe invention concerns a method of and apparatus for forming electrically conductive transparent oxide coatings on water-containing substrates by magnetic-field reinforced cathodic atomization of a target hot-pressed from powdered oxide ceramic materials. The coatings formed have electrical conductivity.When the atomization process is carried out using direct-current voltages of between 150 and 600 volts and a power density of 3 to 15 and preferably 5 to 10 watts/cm2, the degree of pressing of the target is at least 75% of the density of the solid material and the atomization atmosphere is maintained at between 1×10-3 and 5×10-2 mbars with a composition of 2 to 20% oxygen, 40 to 70% hydrogen, and the remainder argon. Based upon the speed of travel of the web, a thickness of coating of between 10 and 100 mm and a specific resistance of between 100 and 10,000 μΩcm are achieved. |
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