Magnetically-assisted sputtering method for producing vertical recording media
Patent 4414087 Issued on November 8, 1983. Estimated Expiration Date: 
January 31, 2003. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.
January 31, 2003. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.Patent ReferencesMagnetion sputtering of ferromagnetic material Cathode target material compositions for magnetic sputtering Method of producing magnetic recording medium Magnetic target plate for use in magnetron sputtering of magnetic films Magnetron sputtering of magnetic materials Electrochemical post treatment of perpendicular magnetic recording media Patent #: 4374009 InventorApplicationNo. 06/462564 filed on 01/31/1983US Classes:204/192.2, Ferromagnetic204/192.15, Specified deposition material or use204/298.19Planar magnetronExaminersPrimary: Demers, Arthur P.Attorney, Agent or FirmInternational ClassesC23C 14/34 (20060101)H01J 37/34 (20060101) H01J 37/32 (20060101) AbstractDisclosed is a method for producing vertical recording media by using magnetically-assisted sputtering apparatus to sputter from a magnetic target while selected portions of the target are heated to a temperature at or above Curie. Also disclosed are improved means for supporting the magnetic target during sputtering which permits the realization of enhanced sputtering efficiencies. |
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