U.S. patents available from 1976 to present.
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Natural lithographic fabrication of microstructures over large areas

Patent 4407695 Issued on October 4, 1983. Estimated Expiration Date: Icon_subject March 29, 2002. Estimated Expiration Date is calculated based on simple USPTO term provisions. It does not account for terminal disclaimers, term adjustments, failure to pay maintenance fees, or other factors which might affect the term of a patent.

Patent References

Strippable resists
Patent #: 4254163
Issued on: 03/03/1981
Inventor: Piazza

Colloidal coating for small three dimensional articles, and particularly for fusion targets having glass shells Patent #: 4315958
Issued on: 02/16/1982
Inventor: Peiffer ,   et al.

Inventors

Application

No. 06/363019 filed on 03/29/1982

US Classes:

216/42, Resist material applied in particulate form or spray204/192.34, Ion beam etching (e.g., ion milling, etc.)216/67, Using plasma257/E21.232, Characterized by their composition, e.g., multilayer masks, materials (EPO)427/198, Deforming the base or coating or removing part of the coating427/272, Mask or stencil utilized427/282Mask or stencil utilized

Examiners

Primary: Powell, William A.

Attorney, Agent or Firm

International Classes

B41M 5/24 (20060101)
G03F 7/004 (20060101)
G03F 7/16 (20060101)
H01L 21/02 (20060101)
H01L 21/308 (20060101)

Abstract

Large area random and mosaic arrays of identical submicron microcolumnar structures can be produced on surfaces by directionally ion etching a monolayer film of spherical colloidal particles.

Other References

  • U Ch. Fischer and H. P. Zingsheim, J. Vac. Sci. Technol., 19(4), 881-885, Nov./Dec. 1981
  • Appl. Phys. Lett., vol. 36, No. 9, May 1, 1980, A New Vacuum-Etched High-Transmittance (Antireflection) Film by Chris M. Horwitz, pp. 728-730
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